Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology.
| Autor: | Sarma, Chandra, Herold, Klaus, Noelscher, Christoph, Schroeder, Paul |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65202B-65202B-7, 7p |
| Databáze: | Complementary Index |
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