Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at = 193nm.
| Autor: | Capetti, Gianfranco, Cantù, Pietro, Galassini, Elisa, Vaglio Pret, Alessandro, Turco, Catia, Vaccaro, Alessandro, Rigolli, Pierluigi, D'Angelo, Fabrizio, Cotti, Gina |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65202K-65202K-12, 12p |
| Databáze: | Complementary Index |
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