A study of overlay mark robustness and enhanced alignment techniques for alignment improvement on metal layers of sub-100nm technology.
| Autor: | Dubey, Kaushalia, Nakamura, Toru, Tanaka, Hiroshi, Hayashi, Nozomu, Egashira, Shinichi, Mishima, Kazuhiko, Mase, Tomohiro, Takeuchi, Tamio, Honda, Akihiko, Kakizaki, Takatoshi |
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| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p652033-652033-11, 11p |
| Databáze: | Complementary Index |
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