OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs.
| Autor: | Nakao, Shuji, Maejima, Shinroku, Yamamoto, Takeshi, Ono, Yoshiharu, Sakai, Junjiro, Yamaguchi, Atsumi, Imai, Akira, Hanawa, Tetsuro, Sukoh, Kazuyuki |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65203W-65203W-9, 9p |
| Databáze: | Complementary Index |
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