Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes.
| Autor: | Le denmat, J. C., Manakli, S., Icard, B., Soonekindt, C., Minghetti, B., Le borgne, O., Pain, L. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p653319-653319-9, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|