EUV-mask pattern inspection using current DUV reticle inspection tool.
| Autor: | Abe, Tsukasa, Fujii, Akiko, Sasaki, Shiho, Mohri, Hiroshi, Imai, Hidemichi, Takaya, Hironobu, Sato, Yasushi, Hayashi, Naoya, Maenaka, Yumiko |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p66070L-66070L-7, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|