New OPC method for contact layer to expand process margin.
Autor: | Oka, Mikio, Oishi, Hidetoshi, Tsuchiya, Kensuke, Ohnuma, Hidetoshi |
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Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p660732-660732-9, 9p |
Databáze: | Complementary Index |
Externí odkaz: |