The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks.
| Autor: | Scholze, Frank, Laubis, Christian, Dersch, Uwe, Pomplun, Jan, Burger, Sven, Schmidt, Frank |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p66171A-66171A-10, 10p |
| Databáze: | Complementary Index |
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