Compensating for image placement errors induced during the fabrication and chucking of EUVL masks.

Autor: Engelstad, Roxann L., Sohn, Jaewoong, Mikkelson, Andrew R., Nataraju, Madhura, Turner, Kevin T.
Zdroj: Proceedings of SPIE; Nov2007, Issue 1, p673004-673004-11, 11p
Databáze: Complementary Index