Overcoming loading challenges in a mask etcher for 45 nm and beyond.
| Autor: | Chandrachood, M., Leung, T. Y. B., Yu, K., Grimbergen, M., Panayil, S., Ibrahim, I., Sabharwal, A., Kumar, A. |
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| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p673046-673046-10, 10p |
| Databáze: | Complementary Index |
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