Integrated scatterometry in high-volume manufacturing for polysilicon gate etch control.
| Autor: | Sendelbach, Matthew, Munoz, Andres, Bandy, Kenneth A., Prager, Dan, Funk, Merritt |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61520F-61520F-17, 17p |
| Databáze: | Complementary Index |
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