Optimization of an integrated and automated macro inspection system for the utilization of wafer color variation detection in a photolithography cluster.
| Autor: | Lickteig, Stephen J., Forstner, Thomas W., Barnett, Anthony R., Dixon, David S., Menon, Vinayan C., Isaacson, Robert L., Nicholls, Matthew C., Liu, Yonqiang, Kinikoglu, Pinar |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61523B-61523B-9, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|