Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography.
| Autor: | Kitayama, Masahiko, Aratani, Ichihiro, Toriumi, Minoru |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61532A-61532A-8, 8p |
| Databáze: | Complementary Index |
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