Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography.
| Autor: | Nakajima, Makoto, Sakaguchi, Takahiro, Hashimoto, Keisuke, Sakamoto, Rikimaru, Kishioka, Takahiro, Takei, Satoshi, Enomoto, Tomoyuki, Nakajima, Yasuyuki |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61532L-61532L-8, 8p |
| Databáze: | Complementary Index |
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