Improved ion implantation masking through photoresist fluorination.

Autor: Montgomery, Patrick K., Peters, Richard D., Garza, Cesar, Breeden, Terry, Azrak, Marijean, Jiang, Jack, Kim, Kiwoon
Zdroj: Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61532Y-61532Y-8, 8p
Databáze: Complementary Index