Improved ion implantation masking through photoresist fluorination.
Autor: | Montgomery, Patrick K., Peters, Richard D., Garza, Cesar, Breeden, Terry, Azrak, Marijean, Jiang, Jack, Kim, Kiwoon |
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Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61532Y-61532Y-8, 8p |
Databáze: | Complementary Index |
Externí odkaz: |