Process development and resist modification for metal trench layers from 65nm to 45nm nodes.
| Autor: | Wu, Steven, Lee, Sho-Shen, Yu, Chun-Chi, Lin, Benjamin, Xu, Cheng Bai, Suzuki, Yasuhiro, Robertson, Stewart, Tanaka, Tsutomu, Wan, I-Yuan |
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| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p615334-615334-14, 14p |
| Databáze: | Complementary Index |
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