Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope.
| Autor: | Tamada, Osamu, Goto, Tomohiro, Sanada, Masakazu, Moriuchi, Takahiro, Niiyama, Takayoshi, Kawai, Akira |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61533P-61533P-8, 8p |
| Databáze: | Complementary Index |
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