LWR reduction in ArF resist pattern by resist smoothing process.
| Autor: | Inatomi, Yuichiro, Kawasaki, Tetsu, Iwashita, Mitsuaki |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61533X-61533X-9, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
| Autor: | Inatomi, Yuichiro, Kawasaki, Tetsu, Iwashita, Mitsuaki |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61533X-61533X-9, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|