Immersion lithography robustness for the C065 node.
| Autor: | Warrick, Scott, Morton, Rob, Mauri, Andrea, Chapon, Jean-Damien, Belledent, Jerome, Conley, Will, Barr, Alex, Lucas, Kevin, Monget, Cedric, Plantier, Valerie, Cruau, David, Gomez, Juan-Manuel, Sicurani, Emmanuel, Gemmink, Jan-Willem |
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| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p615407-615407-12, 12p |
| Databáze: | Complementary Index |
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