Dry-etch proximity function for model-based OPC beyond 65-nm node.
| Autor: | Sato, Shunichiro, Ozawa, Ken, Uesawa, Fumikatsu |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p615504-615504-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Sato, Shunichiro, Ozawa, Ken, Uesawa, Fumikatsu |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p615504-615504-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|