The first full-field EUV masks ready for printing.

Autor: Mickan, Uwe, Groeneveld, Rogier, Demarteau, Marcel, Peters, Jan Hendrik, Dersch, Uwe, Hess, Günter, Seitz, Holger
Zdroj: Proceedings of SPIE; Nov2006, Issue 1, p628105-628105-10, 10p
Databáze: Complementary Index