Lithography process window enhancement using integrated design defect detection and fix.
| Autor: | Su, Bo, Ma, Melody, Vikram, Abhishek, Volk, William, Du, Hong, Verma, Gaurav, Morse, Richard, Chu, Chih-wei, Tsao, Becky, Lin, Char, Chou, Jacky, Tsai, Sidney |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p62830Q-62830Q-9, 9p |
| Databáze: | Complementary Index |
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