Fine pixel SEM image for mask pattern quality assurance based on lithography simulation.
| Autor: | Yamanaka, Eiji, Kariya, Mitsuyo, Yamaguchi, Shinji, Tanaka, Satoshi, Hashimoto, Kohji, Itoh, Masamitsu, Kobayashi, Hideaki, Kawashima, Tsukasa, Narukawa, Shogo |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p62832E-62832E-8, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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