Lithography process margin enhancement using illumination based assist pattern.
| Autor: | Moon, James, Lee, Dong-Jin, Sim, Gui-Hwang, Eum, Jae-Doo, Nam, Byung-Ho, Yim, Dong Gyu |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p62832X-62832X-9, 9p |
| Databáze: | Complementary Index |
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