Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging.
| Autor: | Iwase, Kazuya, Ozawa, Ken, Uesawa, Fumikatsu |
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| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p628337-628337-11, 11p |
| Databáze: | Complementary Index |
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