Manufacturing of the first EUV full-field scanner mask.
| Autor: | Dersch, Uwe, Buettner, Rico, Chovino, Christian, Franz, Steffen, Heins, Torben, Herguth, Holger, Peters, Jan Hendrik, Rode, Thomas, Letzkus, Florian, Butschke, Joerg, Irmscher, Mathias |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63492G-63492G-14, 14p |
| Databáze: | Complementary Index |
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