CD and profile metrology of EUV masks using scatterometry based optical digital profilometry.
| Autor: | Cho, Sung-yong, Yedur, Sanjay, Kwon, Michael, Tabet, Milad |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63492I-63492I-9, 9p |
| Databáze: | Complementary Index |
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