The specification of the 45-nm node photomask repair process.

Autor: Sung, Moon Gyu, Huh, Sungmin, Cha, Byung Cheol, Choi, Sungwoon, Han, Woosung
Zdroj: Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63494H-63494H-9, 9p
Databáze: Complementary Index