The specification of the 45-nm node photomask repair process.
Autor: | Sung, Moon Gyu, Huh, Sungmin, Cha, Byung Cheol, Choi, Sungwoon, Han, Woosung |
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Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63494H-63494H-9, 9p |
Databáze: | Complementary Index |
Externí odkaz: |