Damage thresholds of HfO2/SiO2 and ZrO2/SiO2 high reflectors at 1.064 microns deposited by reactive DC magnetron sputtering.
| Autor: | Reicher, David, Navarro, Martha, Sydenstricker, Robin, Oberling, Jason, Marquez, Micheal, Villafuert, Julio, Ogloza, Albert A., Pentony, Joni, Langston, Peter, O'Conner, David, Marrs, Denton |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p26-33, 8p |
| Databáze: | Complementary Index |
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