EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology.
| Autor: | Stamm, U., Kleinschmidt, J., Gabel, K., Hergenhan, G., Ziener, C., Schriever, G., Ahmad, I., Bolshukhin, D., Brudermann, J., de Bruijn, R., Chin, T. D., Geier, A., Gotze, S., Keller, A., Korobotchko, V., Mader, B., Ringling, J., Brauner, T. |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p236-247, 12p |
| Databáze: | Complementary Index |
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