Proof-of-concept tool development for projection mask-less lithography (PML2).
| Autor: | Doering, Hans-Joachim, Elster, Thomas, Heinitz, Joachim, Fortagne, Olaf, Brandstaetter, Christoph, Haugeneder, Ernst, Eder-Kapl, Stefan, Lammer, Gertraud, Loeschner, Hans, Reimer, Klaus, Eichholz, Joerg, Saniter, Juergen |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p355-365, 11p |
| Databáze: | Complementary Index |
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