Advanced mask metrology enabling characterization of imprint lithography templates.
| Autor: | Myron, L. J., Gershtein, Liraz, Gottlieb, Gidi, Burkhardt, Bob, Griffiths, Andrew, Mellenthin, David, Rentzsch, Kevin, MacDonald, Susan, Hughes, Greg |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p384-391, 8p |
| Databáze: | Complementary Index |
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