Application of scatterometry for evaluation of lithographic process and OPC model generation.
| Autor: | Huang, Karen, Lee, Joungchel, Wen, Youxian, Opsal, Jon |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p536-545, 10p |
| Databáze: | Complementary Index |
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