Impact of EUV mask pattern profile shape on CD measured by CD-SEM.
| Autor: | Dersch, Uwe, Korn, Arnd, Engelmann, Cornelia, Frase, Carl G., Haessler-Grohne, Wolfgang, Bosse, Harald, Letzkus, Florian, Butschke, Joerg |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p632-645, 14p |
| Databáze: | Complementary Index |
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