Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination.
| Autor: | Montgomery, Patrick K., Peters, Richard, Garza Sr., Cesar, Cobb, Jonathan, Darlington, Bill, Parker, Colita, Filipiak, Stan, Babbitt, Danny |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p1024-1033, 10p |
| Databáze: | Complementary Index |
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