Diffusion contributions to line end shortening in 193-nm photolithography.
| Autor: | Son, Eun-Kyung, Kim, Jung-Woo, Lee, Sang-Hyang, Park, Chan-Sik, Lee, Jae-Woo, Kim, Jaehyun, Lee, Geun-Su, Lee, Sung-Koo, Ban, Keun-Do, Jung, Jae-Chang, Bok, Cheol Kyu, Moon, Seung-Chan |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p1040-1048, 9p |
| Databáze: | Complementary Index |
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