32nm node technology development using interference immersion lithography.
| Autor: | Sewell, Harry, McCafferty, Diane, Markoya, Louis, Hendrickx, Eric, Hermans, Jan, Ronse, Kurt |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p491-501, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|