New polymer platform of BARC for ArF lithography.
| Autor: | Hiroi, Yoshiomi, Kishioka, Takahiro, Sakamoto, Rikimaru, Maruyama, Daisuke, Sakaida, Yasushi, Matsumoto, Takashi, Nakajima, Yasuyuki, Chon, SangMun, Kim, YoungHo, Yoon, Sangwoong, Han, Seok, Kim, YoungHoon, Yoon, EunYoung |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p655-662, 8p |
| Databáze: | Complementary Index |
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