Topography impacts on line-width control for gate level lithography.
| Autor: | Gabor, Allen H., Halle, Scott D., Kallingal, Chidam |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p699-707, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Gabor, Allen H., Halle, Scott D., Kallingal, Chidam |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p699-707, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|