Topography impacts on line-width control for gate level lithography.
Autor: | Gabor, Allen H., Halle, Scott D., Kallingal, Chidam |
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Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p699-707, 9p |
Databáze: | Complementary Index |
Externí odkaz: |
Autor: | Gabor, Allen H., Halle, Scott D., Kallingal, Chidam |
---|---|
Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p699-707, 9p |
Databáze: | Complementary Index |
Externí odkaz: |