Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography.
| Autor: | Hori, Tsukasa, Yabu, Takayuki, Ishihara, Takanobu, Watanabe, Takayuki, Wakabayashi, Osamu, Sumitani, Akira, Kakizaki, Kouji, Mizoguchi, Hakaru |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p1285-1292, 8p |
| Databáze: | Complementary Index |
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