Assessment of complementary double dipole lithography for 45nm and 32nm technologies.
| Autor: | Postnikov, Sergei V., Robert, Emilien, Thony, Philippe, Patterson, Kyle, Warrick, Scott, Henry, Daniel, Torres, Andres, Toublan, Olivier |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p1478-1484, 7p |
| Databáze: | Complementary Index |
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