ILSim: a compact simulation tool for interferometric lithography.
Autor: | Fan, Yongfa, Bourov, Anatoly, Zavyalova, Lena, Zhou, Jianming, Estroff, Andrew, Lafferty, Neal, Smith, Bruce W. |
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Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p1805-1816, 12p |
Databáze: | Complementary Index |
Externí odkaz: |