Second generation fluids for 193 nm immersion lithography.
| Autor: | Peng, Sheng, French, Roger H., Qiu, Weiming, Wheland, Robert C., Yang, Min, Lemon, Michael F., Crawford, Michael K. |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p427-434, 8p |
| Databáze: | Complementary Index |
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