Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization.
| Autor: | Warrick, Scott, Hinnen, Paul, Morton, Rob, Cooper, Kevin, Sassoulas, Pierre-Olivier, Depre, Jerome, Navarro, Ramon, van Haren, Richard, Browning, Clyde, Reber, Doug, Megens, Henry |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p854-864, 11p |
| Databáze: | Complementary Index |
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