Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer.

Autor: Ostrom, Thomas, Beyerl, Angela, Sjoberg, Henrik, Newman, Tom, Hogfeldt, Peter
Zdroj: Proceedings of SPIE; Nov2005, Issue 1, p155-166, 12p
Databáze: Complementary Index