Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer.
Autor: | Ostrom, Thomas, Beyerl, Angela, Sjoberg, Henrik, Newman, Tom, Hogfeldt, Peter |
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Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p155-166, 12p |
Databáze: | Complementary Index |
Externí odkaz: |