Defect printability and inspectability of halftone masks for the 90nm and 70nm node.
| Autor: | Eggers, Karin, Gutjahr, Karsten, Peikert, Milko, Rutzinger, Dieter, Ludwig, Ralf, Kaiser, Michael, Durr, Arndt, Heumann, Jan |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p273-281, 9p |
| Databáze: | Complementary Index |
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