Investigating the differences in low-frequency noise behavior of npn and pnp SiGe HBTs fabricated in a complementary SiGe HBT BiCMOS on SOI technology.

Autor: Zhao, Enhai, Krithivasan, Ramkumar, Sutton, Akil K., Jin, Zhenrong, Cressler, John D., El-Kareh, Badih, Balster, Scott, Yasuda, Hiroshi
Zdroj: Proceedings of SPIE; Nov2005, Issue 1, p132-142, 11p
Databáze: Complementary Index