Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node.
| Autor: | Bekaert, Joost, Philipsen, Vicky, Vandenberghe, Geert, van den Broeke, Doug, Degel, Wolfgang, Zibold, Axel |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p59921O-59921O-12, 12p |
| Databáze: | Complementary Index |
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