Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask.
| Autor: | Ma, Jian, Han, Ke, Lee, Kyung, Korobko, Yulia, Silva, Mary, Chavez, Joas, Irvine, Brian, Henrichs, Sven, Chakravorty, Kishore, Olshausen, Robert, Chandramouli, Mahesh, Mammen, Bobby, Padmanaban, Ramaswamy |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p59921P-59921P-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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