Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations.
| Autor: | Chen, Ting, Van Den Broeke, Doug, Hsu, Stephen, Hsu, Michael, Park, Sangbong, Berger, Gabriel, Coskun, Tamer, de Vocht, Joep, Chen, Fung, Socha, Robert, Park, JungChul, Gronlund, Keith |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p599239-599239-11, 11p |
| Databáze: | Complementary Index |
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